Palo Alto, United States
620 Page Mill Rd
N/A
A former Hewlett-Packard manufacture facility for optical electronics equipment from 1962 to 1986. In 1981 an underground tank was found to be leaking volatile organic chemicals (VOCs) into soil and groundwater. Since then 10,700 cubic yards of contaminated soil was removed, soil vapor and groundwater was extracted and treated. In 1992 buildings were demolished, a multi-story office building was constructed with an engineered vapor intrusion barrier; and a ventilated underground parking garage was constructed. From 2010 - 2017 air testing results from vapor intrusion investigations showed elevated levels of trichloroethylene (TCE) in some sub-grade commercial buildings (specifically, in elevator shafts and underground parking garages). Unhealthy levels of vapors were not detected in homes or regularly occupied workspaces. At the present time, the use of groundwater beneath the site is prohibited without additional cleanup. Groundwater extracted by the treatment system is sampled on a monthly basis. Groundwater in wells at the site is sampled on an annual basis.
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